What are the key measures for mulching corn cultivation technology?

The key measures for mulching maize cultivation techniques are as follows. 1. Fine land preparation. Covered corn is generally selected from the middle and upper-fertilized water, flat, gentle slope or high-yield dry land to fully exert its potential for increasing production. Be sure to finely level the ground before planting, remove large clods, stones, pre-roots and weeds. It is necessary to make the ground level and the topsoil fine to ensure the quality of the film. 2. Choose good varieties. Membrane cultivation prolongs the growth time of corn, and should choose excellent hybrids that are 10-15 days longer than the growth period of local corn. Otherwise, the use of short-lived varieties will not achieve the purpose of increasing production. 3, apply enough base fertilizer. After the film is coated, it is not easy to top dress up, and the nutrients in the soil under the film are not easily decomposed, so the base fertilizer should be applied. The base fertilizer should be poured into the autumn ploughing or before the sowing, the high-quality organic fertilizer should be applied with 1000~2000 kg per mu, 15~25 kg of nitrogen fertilizer and 25-40 kg of phosphate fertilizer. 4, timely broadcast early. Since the film cultivation can increase the ground temperature, it can be 10 to 15 days earlier than the local open season. If the area is sown after the film is covered, it is necessary to cover the film 10 to 15 days before the sowing, in order to improve the ground temperature. Ensure that the foot is planted when sowing. After sowing, the film can be used for seeding or hole sowing. If it is sown after mulching, it can be sown at the required density. 2~3 capsules per hole at the time of hole sowing, generally 2~2.5 kg per mu. 5. Reasonable close planting. Close planting is the central link to increase yield of mulch corn. In view of the limitation of membrane width, wide and narrow rows are generally used, and the density ranges from 3,500 to 4,000 plants per mu. For example, when the seedlings are placed, the plant spacing should be strictly controlled to ensure the density. For example, the number of seeding holes per acre should be calculated to ensure the density. 6. Apply herbicides. The herbicide should be applied immediately after the sowing. Use 75 g of sora per acre (or 150 g of Majin), spray 50 kg of water evenly onto the ridge surface with a sprayer, and then immediately cover the film. 7, specifications film. In order to improve economic efficiency, it is better to use a micro film of 0.008 mm thick and 40 to 60 cm wide, and the dosage per acre is 3 to 3.5 kg. A common film having a film thickness of 0.015 mm or less and a film width of 70 to 80 cm may be used, but the cost is high. When laying the film, it must be close to the ground, and the edge of the film should be about 5 cm, and the film edge should be pressed tightly. 8, timely release of seedlings. After the sowing, the emergence of the seedlings should be checked frequently. When the seedlings are unearthed, the above mulch film should be broken in time to induce the seedlings to form a film. The hole should be broken small, and after the seedling is placed, the soil around the base of the stem is tightly sealed with soil. Place the seedlings several times until the whole seedlings are released. 9. Uncover the film and remove the waste film. After the film is covered, the surface temperature in the film is increased, which is unfavorable to the later development of the root system. Therefore, it is necessary to uncover the film in time before the peak of the rainy season, which is beneficial to the lower roots and accept more rainwater. After harvesting, the waste film should be removed to prevent the waste film from damaging the tillage layer, affecting the permeability of the soil and ensuring the next year's high yield. Disclaimer: Some articles on this website are transferred from the Internet. If legal rights of third parties are involved, please inform this website. phone

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